Silicon Technologies: Ion Implantation and Thermal Treatment

Free download. Book file PDF easily for everyone and every device. You can download and read online Silicon Technologies: Ion Implantation and Thermal Treatment file PDF Book only if you are registered here. And also you can download or read online all Book PDF file that related with Silicon Technologies: Ion Implantation and Thermal Treatment book. Happy reading Silicon Technologies: Ion Implantation and Thermal Treatment Bookeveryone. Download file Free Book PDF Silicon Technologies: Ion Implantation and Thermal Treatment at Complete PDF Library. This Book have some digital formats such us :paperbook, ebook, kindle, epub, fb2 and another formats. Here is The CompletePDF Book Library. It's free to register here to get Book file PDF Silicon Technologies: Ion Implantation and Thermal Treatment Pocket Guide.

Navigation menu

Because ion implantation causes damage to the crystal structure of the target which is often unwanted, ion implantation processing is often followed by a thermal annealing. This can be referred to as damage recovery. The amount of crystallographic damage can be enough to completely amorphize the surface of the target: i. In some cases, complete amorphization of a target is preferable to a highly defective crystal: An amorphized film can be regrown at a lower temperature than required to anneal a highly damaged crystal.

Amorphisation of the substrate can occur as a result of the beam damage.

Download Product Flyer

Some of the collision events result in atoms being ejected sputtered from the surface, and thus ion implantation will slowly etch away a surface. The effect is only appreciable for very large doses. If there is a crystallographic structure to the target, and especially in semiconductor substrates where the crystal structure is more open, particular crystallographic directions offer much lower stopping than other directions.